International Journal on Science and Technology

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A Review of Semiconductor Metal Oxides for Hydrogen Sulfide and Methane Gas Detection

Author(s) Mr. Hemant K Suryawanshi, Dr. Surendra M. Yenorkar
Country India
Abstract This review contains comprehensive study of semiconductor metal oxide films gas sensors. SMO are smaller in size, simple fabrication technique, sensitivity and selectivity is good. Review study paper offers understanding about the dopants impurity made the deviations in the SMO materials used to fabrication of gas sensor. Reviews study shows SnO₂-WO₃, ZnO, Au composites good for H2S and methane (CH4) gases it has sensitivity in the range 75 % to 90% at operating temperature between 200 0C to 350 0C. Composites of ZnO-Au, SnO₂, TiO₂ shows decent sensitivity in the range between 72 % to 95% at operating temperature between 200 0C to 350 0C towards H2S and methane (CH4) gases. Pure and composite of different SMO films prepared using Sol-Gel, Sputtering, CVD and Screen printing method result shows Screen printing technique is most preferred and it shows increase in sensitivity at lower operating temperature. This review provides summary of the advance and performance of pure and composites of ZnO and SnO2 based films sensors for H₂S and CH₄ detection, focusing on key parameters such as response time, operating temperature, sensitivity and fabrication technologies. It provides detail analysis of the pure and composite of SnO2 &ZnO towards H₂S and CH₄ and shows future perspective towards increase in sensitivity, lower operating temperature, response time and stability of gas sensor.
Keywords Semiconductor Metal Oxides, Pure and Composite of ZnO
Field Physics
Published In Volume 16, Issue 1, January-March 2025
Published On 2025-01-11
Cite This A Review of Semiconductor Metal Oxides for Hydrogen Sulfide and Methane Gas Detection - Mr. Hemant K Suryawanshi, Dr. Surendra M. Yenorkar - IJSAT Volume 16, Issue 1, January-March 2025. DOI 10.71097/IJSAT.v16.i1.1394
DOI https://doi.org/10.71097/IJSAT.v16.i1.1394
Short DOI https://doi.org/g82pcc
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